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關(guān)于數(shù)控穩(wěn)壓電源的外文翻譯-----------雙極性脈沖電鍍電源的設(shè)計.rar

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關(guān)于數(shù)控穩(wěn)壓電源的外文翻譯-----------雙極性脈沖電鍍電源的設(shè)計,摘要:雙極性脈沖數(shù)字電源被用來設(shè)計電鍍。在設(shè)計中為了產(chǎn)生pwm脈沖dspic30f3011是用來充當(dāng)單片機的。m57962l是用來驅(qū)動igbt的。因此,是用光合耦合器來隔離電源主回路控制器。lm331是用來處理a/d轉(zhuǎn)換的。pi的算法是通過控制輸出電壓和輸出電流。試用證明該控制器具有良好的穩(wěn)定性,且它可以輸出雙極脈沖,...
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原文檔由會員 wanli1988go 發(fā)布


摘要:雙極性脈沖數(shù)字電源被用來設(shè)計電鍍。在設(shè)計中為了產(chǎn)生PWM脈沖dsPIC30F3011是用來充當(dāng)單片機的。M57962L是用來驅(qū)動IGBT的。因此,是用光合耦合器來隔離電源主回路控制器。LM331是用來處理A/D轉(zhuǎn)換的。PI的算法是通過控制輸出電壓和輸出電流。試用證明該控制器具有良好的穩(wěn)定性,且它可以輸出雙極脈沖,其頻率可調(diào)范圍為10HZ到10KHZ。
關(guān)鍵字:雙極性脈沖,數(shù)字電源,PWM。



























1. 引言
電鍍電源是在電鍍工業(yè)領(lǐng)域的關(guān)鍵設(shè)備之一。在目前直流電源和脈沖電源是作為在電源類中的佼佼者而被廣泛使用。直流電源輸出連續(xù)光滑的電流。在電鍍過程中,隨著時間的變化,電流不會改變目前的方向。雖然采用直流電源因為直流密度大,但是電流效率低,而且它的電鍍層質(zhì)量不好。因為在脈沖電源條件下電鍍層的晶體小,更微妙的和對稱的電鍍層可以得到【1】。而且它的原材料可以被保存,所以在電鍍領(lǐng)域脈沖電源已經(jīng)快速發(fā)展【2】。
目前,脈沖電源的研究集中在多變的極性脈沖和高功率【3】。在本文中,介紹了雙極性脈沖電源,其脈沖寬度和頻率是通過自我設(shè)計而實現(xiàn)可調(diào)的。主要工藝參數(shù)如下所列。脈沖幅度范圍從0到24V。脈沖頻率范圍從10到10kHz。脈沖的占空比,可以改變從0.3到0.9。
2. 硬件設(shè)計
2.1脈沖電源的主回路
由于電源工作時,正電壓和負電壓是不均衡的,即正負脈沖的占空比和工作時間通常是不同的,采用兩個參數(shù)可單獨調(diào)整。
圖1是脈沖電源主回路的方塊圖。

Abstract –The double polar pulse digital power source was
designed for plating. dsPIC30F3011 acted as MCU for producing
PWM pulse in the design. M57962L was used to drive IGBT. So
as to isolate controller from main loop of power by
opticalcoupler, LM331 was used to process conversion of A/D.
Arithmetic of PI was adopted to control output voltage and
current. The tryout proved the controller has good stability and
it can output double pole pulse whose frequency is adjustable
from 10HZ to 10KHZ.
Index Terms - double pole pulse, digital power source, PWM

I. INTRODUCTION
Plating power is one of key device in the field of plating
industry. DC power and pulse power are two kings of power
widely used at present. DC power output continuous smooth
current. And the direction of current doesn’t change along
with the change of time in the course of plating. Although the
value of current density is big while DC power is adopted,
current efficiency is low and quality of plating layer is bad.
Because crystal of plating layer is small under pulse power
condition, more subtle and symmetrical plating layer can be
obtained[1]. And raw material can be saved, so pulse power
has been developed rapidly in plating domain[2].